In the manufacture process of integrated circuit (IC), lithography occupy a very important step, and the quality of photomask used in lithography affects the yield of LSI.

光刻是大规模集成电路生产流程中十分关键的一环，而光刻中使用的掩模的质量对大规模集成电路的成品率有很大的影响。

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Abstract: Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.

摘要：投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。

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Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.

投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。

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